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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Journal of Phytopath...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Journal of Phytopathology
Article . 2012 . Peer-reviewed
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Silicon Suppresses Fusarium Wilt Development in Banana Plants

Authors: Alessandro Antonio Fortunato; Fabrício Ávila Rodrigues; Júlio Cezar Parpaiola Baroni; Gustavo César Barbosa Soares; Miguel Angel Dita Rodriguez; Olinto Liparini Pereira;

Silicon Suppresses Fusarium Wilt Development in Banana Plants

Abstract

AbstractThis study aimed to determine the effect of silicon (Si) in reducing the symptoms of Fusarium wilt, caused by Fusarium oxysporum f. sp. cubense (Foc), on banana plants. Banana seedlings of Grand Nain (resistant) and Maçã (susceptible) were grown in plastic trays amended with 0 (−Si) or 0.39 g Si (+Si) per kg of soil and inoculated with Foc at 60 days after transplanting. The Si concentration in the roots and rhizome‐pseudostem significantly increased by 30.26 and 58.82%, respectively, for the +Si treatment compared with −Si treatment. The Si concentration in the roots and rhizome‐pseudostem of Grand Nain plants was, respectively, 11.57 and 37.04% greater than that found in Maçã. The +Si plants showed a reduction of 12.37, 49.81, 51.87 and 20.39%, respectively, for the area under reflex leaf symptoms progress curve, the area under root symptoms progress curve, the area under disease progress curve and the area under asymptomatic fungal colonization of tissue progress curve compared with ‐Si plants. The area under darkening of rhizome‐pseudostem progress curve (AUDRPPC) of Maçã significantly increased by 15.98% for the −Si treatment in comparison with the +Si treatment. For the +Si treatment, the AUDRPPC of the plants from the Maçã cultivar significantly decreased by 20.59% in comparison with the plants from the Grand Nain cultivar. The area under relative lesion length progress curve (AURLLPC) of the plants from the Maçã cultivar significantly decreased by 41.54% for the +Si treatment in comparison with the −Si treatment. There was no significant difference between the ‐Si and +Si treatments in the AUDRPPC and AURLLPC of Grand Nain. For the +Si treatment, the AURLLPC of Grand Nain significantly decreased by 9.23% in comparison with Maçã. There was no significant difference between the Grand Nain and Maçã for the AUDRPPC and AURLLPC in the −Si treatment. The findings of this study show that supplying Si to banana plants, especially to a susceptible cultivar to Foc, had a great potential in reducing the intensity of Fusarium wilt and may play a key role in disease management when banana plants are cultivated in Si‐deficient soils infested by this pathogen.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
57
Top 10%
Top 10%
Top 10%
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