AbstractAtomic layer deposition, ALd, is a thin film deposition technology that enables new and highly competitive products. As a disruptive technology, it can often replace existing production technology and improve throughput, coating quality and sometimes process sustainability. ALd is also a powerful resource for advanced nanotechnology research.Today's industrial applications of ALd habitually address a concrete requirement to manufacture precise nanometer–thick, dense and pinhole–free conformal thin films of exact chemical composition on various shapes and geometries. For today's businesses, ALd and Beneq offer the necessary tools to enable growth, by means of new and innovative applications, reliable production equipment and attractive cost of ownership.