
Despite the considerable contributions of conductive probe atomic force microscopy (C‐AFM) to the understanding of materials and devices’ properties at the nanoscale, measurements remain prone to an arsenal of artifact‐inducing factors. Herein, new calibration samples are developed enabling an easy access to highly accurate calibrated C‐AFM measurements over expanded resistance and current ranges from 1 kΩ to 1 TΩ and from 10 fA to 10 μA. For this purpose, the influence of the AFM probe (material, wear) is investigated by operating C‐AFM in spectroscopy and imaging modes. Commendable measurement protocols are elaborated with associated simplified uncertainty budgets, showing that the combined standard uncertainties do not exceed a few percent over the whole resistance and current ranges. These calibration samples pave the way for reliable and reproducible quantitative measurements of resistance and current at the nanoscale, and the findings are expected to promote the adoption of the C‐AFM for these nanoscale measurements.
resistance, [SPI] Engineering Sciences [physics], measurement protocols, conductive probe atomic force microscope, nanoscale, calibration, current, reference samples
resistance, [SPI] Engineering Sciences [physics], measurement protocols, conductive probe atomic force microscope, nanoscale, calibration, current, reference samples
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