AbstractTwo‐Photon Lithography, thanks to its very high sub‐diffraction resolution, has become the lithographic technique par excellence in applications requiring small feature sizes and complex 3D pattering. Despite this, the fabrication times required for extended structures remain much longer than those of other competing techniques (UV mask lithography, nanoimprinting, etc.). Its low throughput prevents its wide adoption in industrial applications. To increase it, over the years different solutions have been proposed, although their usage is difficult to generalize and may be limited depending on the specific application. A promising strategy to further increase the throughput of Two‐Photon Lithography, opening a concrete window for its adoption in industry, lies in its combination with holography approaches: in this way it is possible to generate dozens of foci from a single laser beam, thus parallelizing the fabrication of periodic structures, or to engineer the intensity distribution on the writing plane in a complex way, obtaining 3D microstructures with a single exposure. Here, the fundamental concepts behind high‐speed Two‐Photon Lithography and its combination with holography are discussed, and the literary production of recent years that exploits such techniques is reviewed, and contextualized according to the topic covered.