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Other literature type . 2023
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Other literature type . 2023
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Etching SiO2 without HF

Authors: Thomas Pucher; Yu Kyoung Ryu; Andres Castellanos-Gomez;

Etching SiO2 without HF

Abstract

In this technical note we share our experience etching SiO2 in SiO2/Si wafers without using hydrofluoric acid (HF). We have been using glass etching cream (in particular Armour Etch) which relaxes the safety when performing this etching process substantially.

Keywords

glass etching cream, clean room, micro-fabrication, Armour Etch, silicon oxide etching

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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