Platinum (Pt) and palladium (Pd) Schottky diodes on n-type GaN grown by metalorganic chemical vapor deposition were achieved and investigated. Aluminum was used for ohmic contacts. Barrier heights were determined to be as high as ΦB=1.13 eV by the current–voltage (I–V) method and ΦB=1.27 eV by the capacitance–voltage (C–V) method for the Pt/GaN diode, and ΦB=1.11 eV, ΦB=0.96 eV, and ΦB=1.24 eV by I–V, activation energy (I–V–T), and C–V methods for the Pd/GaN diode, respectively. The ideality factors were obtained to be n∼1.10.