Atomic Layer Deposition (ALD) principles, benefits, and applications
Cunha, Florival Moura; Silva, Manuel Fernando Ribeiro; Correia, J. H.;
Atomic Layer Deposition (ALD) principles, benefits, and applications
[Excerpt] The Atomic Layer Deposition (ALD) technique is a cyclic deposition technique based on the sequential purging of the precursors and co-reactants with self-limiting surface reactions. The ALD process grows ultra-thin films (< 20 nm) in two half-cycles, sub-monolayer by sub-monolayer (Figure 1). [...]
Portugal
- University of Minho Portugal
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These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
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This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
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