Thin films of lithium nickel oxide were deposited by sputtering and pulsed laser deposition (PLD) from targets of pressed LiNiO{sub 2} powder. The composition and structure of these films were analyzed using a variety of techniques, such as nuclear-reaction analysis, Rutherford backscattering spectrometry (RBS), x-ray diffraction, infrared spectroscopy, and atomic force microscopy. Crystalline structure, surface morphology and chemical composition of Li{sub x}Ni{sub 1{minus}x}O thin films depend strongly on deposition oxygen pressure, temperature as well as substrate-target distance. The films produced at temperatures lower than 600 C spontaneously absorb CO{sub 2} and H{sub 2}O at their surface once they are exposed to the air. The films deposited at 600 C proved to be stable in air over a long period. Even at room temperature the PLD films are denser and more stable than sputtered films. RBS determined the composition of the best films to be Li{sub 0.5}Ni{sub 0.5}O deposited by PLD at 60 mTorr O{sub 2} pressure. Electrochemical tests show that the films exhibit excellent reversibility in the range 1.0 V to 3.4 V versus lithium. Electrochemical formatting which is used to develop electrochromism in other films is not needed for the stoichiometric films. The optical transmission range is almost 70% at 550 nm for 150-nm thick films. Devices made from these films were analyzed using novel reference electrodes and by disassembly after cycling.