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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao MRS Proceedingsarrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
MRS Proceedings
Article . 2003 . Peer-reviewed
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Effect of Temperature and Temperature Uniformity on Plasma and Device Stability

Authors: G. Ganguly; M.S. Bennett; D.E. Carlson; R.R. Arya;

Effect of Temperature and Temperature Uniformity on Plasma and Device Stability

Abstract

AbstractWe have investigated the changes in the cathode potential in a dc discharge of silane and hydrogen used to deposit the intrinsic layer of p-i-n type solar cells at deposition rates from 1 to 10Å/s with the superstrate temperature at 200°C and 250°C. Under plasma conditions that lead to higher deposition rates (5-10Å/s), fluctuations of the cathode potential which are suggestive of the formation and de-trapping of particulates in/from the plasma, are observed at 200°C but disappear at 250°C. Improvement of the temperature uniformity over the plasma region from 1.7°C/cm to 0.7°C/cm removes the fluctuations of the cathode potential even at 200°C, indicating that the particulates are formed predominantly at the plasma boundary. Consequently, the stability of solar cells with i-layers deposited at ~10Å/s in the center of the plasma region at the same superstrate temperature improved by 26% suggesting that multiple silicon containing molecules diffuse from the edge to the center of the plasma region.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
1
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