The role of ion-assisted deposition in PVD

descriptionPublicationkeyboard_double_arrow_right Article , Other literature type 29 Feb 2008Publisher:SPIEJournal:SPIE Proceedings, volume 6,984, page 698,420 (issn: 0277-786X,

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Authors: Z. Q. Ma; C. B. Feng; X. Tang; F. Li; B. He; B. B. Shi;

doi: 10.1117/12.792012

The role of ion-assisted deposition in PVD

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Abstract

An optimal energy interval in ion-assisted deposition of high crystalline films is predicted in the modeling of ion impacting on surface. The result is in good agreement with the presented experiments. The possible application of the evaluation of ion role for the fabrication of potential thin film materials is expected.

Related Organizations

Shanghai University
China (People's Republic of)
Shanghai University
China (People's Republic of)

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