Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter

Mingtao Li; Hua Tan; Linshu Kong; Larry Koecher

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https://doi.org/10.1...arrow_drop_down

https://doi.org/10.1117/12.537...

Article . 2004 . Peer-reviewed

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https://dx.doi.org/10.1117/12....

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Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter

descriptionPublicationkeyboard_double_arrow_right Article , Other literature type 20 May 2004Publisher:SPIEJournal:SPIE Proceedings, volume 5,374, page 209 (issn: 0277-786X,

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Authors: Mingtao Li; Hua Tan; Linshu Kong; Larry Koecher;

doi: 10.1117/12.537232

Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter

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Abstract

Photo-curable nanoimprint lithography (P-NIL), a low pressure and room temperature process, is developed on Nanonex NX-2000 nanoimprintor. The process is capable of achieving uniform imprinting over large area in less than 60 seconds, which is mainly attributed to the Nanonex patented air cushion press (ACP) technology. Nanostructures such as 200nm pitch grating have been successfully demonstrated on 4-inch wafer level using P-NIL on NX-2000 nanoimprintor.

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NYNEX
United States

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