Metallic nanoslit waveguides are promising candidates for ultrahigh-density optical interconnections. A variety of devices based on metallic nanoslit waveguides have already been proposed that show a great superiority over conventional photonic devices for compactness. However very few two-dimensional devices have been experimentally demonstrated with in-plane geometries due to fabrication difficulties. In this article, a feasible process is presented using traditional semiconductor fabrication technologies such as mix-and-match lithography and electroplating, which is cable of fabricating complicated 100 nm wide, 800 nm deep gold slit waveguides with multiple sharp right-angle corners. The process can be extended to volume production manufacturing with minor modifications, thus enabling the fabrication of nanoslit photonic circuits and networks.