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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao IEEE Transactions on...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
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Additive Manufacturing With Strontium Hexaferrite-Photoresist Composite

Authors: Max Ho; Srinivas P. M. Nagaraja; Rüştü Umut Tok; Aysan Rangchian; Pirouz Kavehpour; Yuanxun Ethan Wang; Rob Candler;

Additive Manufacturing With Strontium Hexaferrite-Photoresist Composite

Abstract

Millimeter wave components, such as circulators and isolators, frequently use magnetic fields to break symmetry of the signal propagation and provide unidirectional signal transmission. While effective, these components have not seen the level of miniaturization of other millimeter wave components, primarily due to the discrete nature of the magnets used in the components. Using circulators in the 40-50 GHz range as a motivating application, requirements arise for the deposited films, namely immunity to eddy currents, sufficient magnetization to act as self-biasing magnets, and out-of-plane orientation of the self-biasing field. Based on these required properties, hexaferrite materials are selected for their strong magnetocrystalline anisotropy (MCA) and low conductance. The difficulty of integrating these components monolithically with monolithic microwave integrated circuits (MMIC) originates from the incompatibility of crystal structure with standard semiconductor materials and process conditions. Additive manufacturing using a composite of strontium hexaferrite (SrFe12O19) particles and photoresist has been chosen as a method to overcome the difficulties of integrating hexaferrite material to semiconductor substrates. Due to their large internal anisotropy field, the particles of strontium hexaferrite tend to rotate to the field direction instead of changing magnetization direction under application of an external magnetic field (less than the anisotropy field). We have developed a method for 3D printing composites of high strontium hexaferrite concentration (up to 20% by volume) in a liquid photoresist, SU8. Rotation of hexaferrite particles in polymer matrix and thus magnetic anisotropy has been demonstrated in the composite, which is subsequently cured to hold the physical position and orientation of the particles. The anisotropy of the self-biasing field provided by the films has been experimentally characterized, and a ferromagnetic resonance (FMR) frequency ~43 GHz has been observed. We have also characterized the viscosity of the particle-laden polymer at different particle concentrations. 3D printing of this composite with poling will make it possible to directly print magnetic components that require out-of-plane anisotropic magnetization.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
7
Top 10%
Average
Top 10%
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