Summary form only given. Microelectromechanical systems (MEMS) hold promise for incorporating sensors, actuators, and microelectronics in a single, monolithic package. It is also useful to include plasma generation capability within some MEMS devices for applications such as spectroscopic chemical analysis, mass spectrometry, micropropulsion, lighting, and materials processing. This talk will address the development and characterization of a microfabricated inductively coupled plasma (ICP) source. Using surface micromachining techniques similar to those used in the manufacture of microelectronics, we have developed a method of fabricating ICPs on glass wafers. The technique creates a planar microstructure by electroplating gold inductors and capacitors within a lithographically defined photoresist mold.