
This letter studies the intrinsic variability in oxide-based resistive RAM technology, highlighting the presence of a short range ( $\approx 40$ ) correlation of resistances among cycles (for both low resistance state and high resistance state). Experimental results demonstrate the existence of a resistance correlation, and an analytical model is proposed in order to explain the findings. The presence of the correlation seems to indicate that the conductive filament, which is believed to be the basis of resistive RAM behavior, keeps for a limited number of cycling operations a memory of its morphology. The extension of this correlation depends on the programming conditions.
OxRAM, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Variability, HfO2, 620, Correlation
OxRAM, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Variability, HfO2, 620, Correlation
| selected citations These citations are derived from selected sources. This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | 17 | |
| popularity This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network. | Top 10% | |
| influence This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | Top 10% | |
| impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network. | Top 10% |
