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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao IEEE Transactions on...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
IEEE Transactions on Semiconductor Manufacturing
Article . 1998 . Peer-reviewed
License: IEEE Copyright
Data sources: Crossref
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Application of non-normal process capability indices to semiconductor quality control

Authors: BITTANTI, SERGIO; LOVERA, MARCO; L. MOIRAGHI;

Application of non-normal process capability indices to semiconductor quality control

Abstract

The definition and estimation of process capability indices are usually based on the assumption that the production process under investigation is characterized by a normal distribution; however, the case of nonnormal processes occurs frequently in practice, as, for example, in the semiconductor industry. This paper addresses the problem of defining and computing reliable estimates for process capability indices (and particularly for C/sub pk/) for nonnormal processes; in particular, a curve-fitting approach to the estimation problem is taken and the problem of providing confidence intervals for the estimates of PCI's is considered. Finally, some application examples are also presented.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
30
Top 10%
Top 10%
Average
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