In this paper we describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a vacuum ultraviolet (VUV) source for high resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm. Using this laser as a source for contact lithography, we made resist lines as narrow as 150 nm, the smallest features yet reproduced by photolithography.