A magnetically enhanced radio-frequency (rf) plasma source operating on water vapor has an extensive list of potential applications. In this work, the use of a rf plasma source to dissociate water vapor for hydrogen production is investigated. This paper describes a rf plasma source operated on water vapor and characterizes its plasma properties using a Langmuir probe, a residual gas analyzer, and a spectrometer. The plasma source operated first on argon and then on water vapor at operating pressures just over 300 mtorr. Argon and water vapor plasma number densities differ significantly. In the electropositive argon plasma, quasineutrality requires ni≃ne, where ni is the positive ion density. But in the electronegative water plasma, quasineutrality requires ni+=ni−+ne. The positive ion density and electron density of the water vapor plasma are approximately one and two orders of magnitude lower, respectively, than those of argon plasma. These results suggest that attachment and dissociative attachment are present in electronegative water vapor plasma. The electron temperature for this water vapor plasma source is between 1.5 and 4 eV. Without an applied axial magnetic field, hydrogen production increases linearly with rf power. With an axial magnetic field, hydrogen production jumps to a maximum value at 500 W and then saturates with rf power. The presence of the applied axial magnetic field is therefore shown to enhance hydrogen production.