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Dielectric Loss Mechanism in Rutile (TiO2)

Authors: Johnson, O. W.; Deford, John W.; Myhra, Sverre;

Dielectric Loss Mechanism in Rutile (TiO2)

Abstract

A new mechanism to account for the anomalously large dielectric loss and apparent dielectric constant frequently observed in TiO2 is presented, which appears to agree well with experiment. The mechanism involves field-induced donor migration where the field arises from a difference in work function between the rutile and a metal electrode. This migration results in a large decrease in electronic resistivity in the bulk of the crystal, with relatively thin insulating layers near the electrode surface. Experimental results on a variety of crystals are discussed, and the influence of electrode materials, surface condition, heat treatment, and ambient is analyzed. A method for numerically calculating the resistivity profile of such a crystal from dielectric loss data is described. Results indicative of room-temperature p-type conductivity and a voltage-induced conduction process are presented.

Country
Australia
Related Organizations
Keywords

General Physics and Astronomy, 3100 Physics and Astronomy

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Found an issue? Give us feedback
selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
19
Average
Top 10%
Top 10%
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