
doi: 10.1038/ncomms1067
pmid: 20865806
Reduced graphene oxides (RG-Os) have attracted considerable interest, given their potential applications in electronic and optoelectronic devices and circuits. However, very little is known regarding the chemically induced reduction method of graphene oxide (G-O) in both solution and gas phases, with the exception of the hydrazine-reducing agent, even though it is essential to use the vapour phase for the patterning of hydrophilic G-Os on prepatterned substrates and in situ reduction to hydrophobic RG-Os. In this paper, we report a novel reducing agent system (hydriodic acid with acetic acid (HI-AcOH)) that allows for an efficient, one-pot reduction of a solution-phased RG-O powder and vapour-phased RG-O (VRG-O) paper and thin film. The reducing agent system provided highly qualified RG-Os by mass production, resulting in highly conducting RG-O(HI-AcOH). Moreover, VRG-O(HI-AcOH) paper and thin films were prepared at low temperatures (40 °C) and were found to be applicable to flexible devices. This one-pot method is expected to advance research on highly conducting graphene platelets.
Optical Devices, Graphite, Oxides, Electronics, Oxidation-Reduction
Optical Devices, Graphite, Oxides, Electronics, Oxidation-Reduction
| selected citations These citations are derived from selected sources. This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | 2K | |
| popularity This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network. | Top 0.01% | |
| influence This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | Top 0.1% | |
| impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network. | Top 0.1% |
