Abstract In this paper the possibilities of femtosecond laser micromachining of thin-film titanium coatings for elements of microelectronics and optoelectronics are considered. Using pulsed laser deposition in vacuum (wavelength λ = 1030 nm, pulse repetition frequency f = 10 kHz, Emax pulse energy ≈ 150 μJ, pulse duration τ ≈ 280 fs), a thin-film titanium coating was obtained on the surface of the quartz substrate. An example of the formation of an element of a given geometry by selective laser ablation of areas of a deposited metal coating is shown.