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image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Journal of Quantitat...arrow_drop_down
image/svg+xml Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao Closed Access logo, derived from PLoS Open Access logo. This version with transparent background. http://commons.wikimedia.org/wiki/File:Closed_Access_logo_transparent.svg Jakob Voss, based on art designer at PLoS, modified by Wikipedia users Nina and Beao
Journal of Quantitative Spectroscopy and Radiative Transfer
Article . 2013 . Peer-reviewed
License: Elsevier TDM
Data sources: Crossref
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Si and SiO detection in a HMDSO/propane/air flame using spatially resolved optical emission spectroscopy (OES)

Authors: A. Burkert; D. Müller; W. Paa;

Si and SiO detection in a HMDSO/propane/air flame using spatially resolved optical emission spectroscopy (OES)

Abstract

Abstract Optical emission spectra of rich HMDSO/propane/air and propane/air flames (equivalence ratio Φ=1.33) were recorded using an imaging spectrometer in combination with an intensified CCD camera. The probe area was about 1×0.2 mm2. This is small for the OES signal and allows scans of high spectral and spatial resolution across the flame. Emission lines of Si⁎ (∼252 nm) and SiO⁎ (220–265 nm) were registered at different heights above the slit burner. Si⁎ and SiO⁎ were found up to 10 and 40 mm above the burner, respectively. Up to a HMDSO concentration of 0.015% in the total gas flow a linear dependence between Si⁎ and HMDSO concentration could be proved. Gas temperatures were determined using Raman scattering by N2 molecules and compared with temperatures derived from simulations of CH⁎ (A–X) and OH⁎ (A–X) spectra. N2 and CH⁎ temperatures are within (1950±50) K and (2400±500) K in a good agreement, respectively. At a height of 12 mm above the burner the OH⁎ (A–X) molecules have a temperature of (6700±500) K. We suggest to position substrates for coating applications in a distance of 8 to 10 mm from the burner to use the high OH⁎ concentration for SiO2 layer deposition.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
20
Top 10%
Top 10%
Top 10%
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