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pmid: 30248642
Atomic layer deposition (ALD) is a thin film deposition technique currently used in various nanofabrication processes for microelectronic applications. The ability to coat high aspect ratio structures with a wide range of materials, the excellent conformality, and the exquisite thickness control have made ALD an essential tool for the fabrication of many devices, including biosensors. This mini-review aims to provide a summary of the different ways ALD has been used to prepare biosensor devices. The materials that have been deposited by ALD, the use of the ALD layers prepared and the different types of biosensors fabricated are presented. A selected list of studies will be used to illustrate how the ALD route can be implemented to improve the operational performance of biosensors. This work comprehensively shows the benefits of ALD and its application in various facets of biosensing and will help in exploiting the numerous prospects of this emerging and growing field.
Surface Properties, Atomic layer deposition, Biosensing Techniques, Equipment Design, Nanofabrication, Nanostructures, [CHIM] Chemical Sciences, Animals, Humans, Nanotechnology, Biosensor
Surface Properties, Atomic layer deposition, Biosensing Techniques, Equipment Design, Nanofabrication, Nanostructures, [CHIM] Chemical Sciences, Animals, Humans, Nanotechnology, Biosensor
citations This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | 101 | |
popularity This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network. | Top 1% | |
influence This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | Top 10% | |
impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network. | Top 1% |