
Abstract The original target utilization is only about 30% in the CIGS (Cu(In, Ga)Se 2 ) thin film solar cell sputtering process. The remaining 70% of the target must be recycled to achieve sustainable use of the rare metals, In, Ga, and Se. It is therefore very important to establish spent CIGS target recycling technology to reduce environmental damage. High CIGS recovery was obtained in this study by autoclave leaching CIGS powder in a sulfate solution using H 2 O 2 as the strong oxidant. The CIGS leaching mechanism was studied using XRD and SEM. H 2 O 2 was first adsorbed onto the CIGS surface. Then copper–selenium compound was formed on the CIGS surface. The copper–selenium compound decomposition is the rate-controlling step in the CIGS leaching process. Nearly complete CIGS dissolution can be obtained by autoclave leaching at 140 °C for 4 h using 3 M H 2 SO 4 as the leaching agent and H 2 O 2 as the oxidant. In this study, a direct recycling process combining leaching process and re-synthesis of CIGS nanoparticles was developed to recover CIGS materials for reinsertion into the CIGS supply chain. Mono-dispersed CIGS nano-particles with the mean particle size of 9 nm can be obtained using spent CIGS target as raw materials.
| selected citations These citations are derived from selected sources. This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | 23 | |
| popularity This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network. | Top 10% | |
| influence This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | Top 10% | |
| impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network. | Average |
