Numerical simulation of wet-chemical etching

descriptionPublicationkeyboard_double_arrow_right Part of book or chapter of book , Conference object , Other literature type 07 Apr 2008 Netherlands English Publisher:Springer Berlin Heidelberg

Authors: Driesen, Cornelus Hendricus; Kuerten, Johannes G.M.; Kuiken, H.K.; Zandbergen, P.J.;

doi: 10.1007/bfb0106624

Numerical simulation of wet-chemical etching

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Abstract

The concentration of dissolved material in an etch-hole is computed in order to construct a numerical simulation of wet-chemical etching. Using a number of assumptions an approximate convection-diffusion equation is formulated. In this way, analytical descriptions for the concentration in different parts of the domain are obtained. By a coupling of these descriptions the concentration can be computed. The result is validated by comparison with a finite-volume method. Results of the boundary-layer method are given for an etch-hole geometry.

Country

Netherlands

Related Organizations

University of Twente
Netherlands

Keywords

Boundary-element method, Etching

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