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Article . 1992 . Peer-reviewed
License: Springer TDM
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Depositing copper patterns on Teflon

Authors: R. R. Rye; M. J. Hampden-Smith; T. T. Kodas;

Depositing copper patterns on Teflon

Abstract

Printed circuit boards composed of patterned cooper features on poly(tetrafluorethylene), better known by the E.I. du Pont de Nemours and Company trade name Teflon, are currently used for high-frequency applications. The choice of these materials is based on the high conductivity of copper and the facts that Teflon has One of the lowest reported dielectric constants ({approximately}2.0). Low dissipation factors. High thermal stability. High chemical resistance. This paper reports that the high conductivity of copper, coupled with the low dielectric constant of Teflon, allows high-frequency operation and/or extensive miniaturization. However, one of Teflon's most important properties is chemical and physical inertness. While this property is extremely attractive in numerous applications involving hostile environments, it presents major problems in metallization for electronic applications. To address this condition, researchers at Sandia National Laboratories and the University of New Mexico have developed a three-step, additive method for the patterned deposition of copper on Teflon. Still, while the example of deposition work examined in this article is recent, it is nonetheless supported by considerable prior work on the patterned etching of Teflon and copper chemical vapor deposition (CVD).

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
1
Average
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