The carrier injection from the active-layer of the submicron-gate-lengthMesfet into the buffer-layer, or substrate in general, is studied by means of a two-dimensional computer simulation in which the energy conservation equation is simultaneously solved with the carrier conservation equation and Poisson’s equation. The mobility, electron temperature and energy relaxation time are treated as energy dependent parameters. This model is capable of simulating the non-stationary conditions associated with the submicron-gate-length devices. The effect of the carrier injection on the I-V characteristics as well as on the small-signal parameters is investigated by simulating twoMesfet structures; the first is aMesfet on a perfect buffer-layer while the second is a symmetricalMesfet which has no substrate. It is found out that the drain current is increased by the carrier injection, whereas the transconductance is reduced due to the increase of the device dynamic range. TheMesfet with an interfacial potential barrier is also simulated. It exhibits characteristics intermediate between those of the other two devices.