Two different modes of sample excitation have been used for elemental analysis of thin standard reference materials and of chemical standards with known composition. PIXE /2.5 MeV protons/ and XRF induced by PIXE, will be called XRF-PIXE /2.5 MeV protons on Mo primary target/. The same samples were alternatively exposed to protons and X-ray beams. The sensitivities under standard running conditions are determined for both an XRF-PIXE and a PIXE analysis system. It is shown that the sensitivity of the PIXE spectrometer depends strongly on the sample matrix, whereas the XRF-PIXE sensitivity is rather constant with respect to different kinds of samples. In addition, the advantages of one mode of excitation on the other are discussed. It is shown that XRF-PIXE can be a useful complement to PIXE analysis.