The induction plasma chemical reactor: Part I. Equilibrium model

descriptionPublicationkeyboard_double_arrow_right Article 01 Mar 1990 English Publisher:Springer Science and Business Media LLCJournal:Plasma Chemistry and Plasma Processing, volume 10, pages 133-150 (issn: 0272-4324, eissn: 1572-8986,

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Authors: G. Y. Zhao; J. Mostaghimi; M. I. Boulos;

doi: 10.1007/bf01460452

The induction plasma chemical reactor: Part I. Equilibrium model

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Abstract

A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4.

Related Organizations

Chinese Academy of Sciences
China (People's Republic of)
Université de Sherbrooke
Canada
Institute of Mechanics
China (People's Republic of)

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