Low pressure gain measurements in KrF

descriptionPublicationkeyboard_double_arrow_right Article 01 May 1991 English Publisher:Springer Science and Business Media LLCJournal:Applied Physics B Photophysics and Laser Chemistry, volume 52, pages 331-335 (issn: 0721-7269, eissn: 1432-0649,

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Authors: G. J. Hirst; M. J. Shaw;

doi: 10.1007/bf00325491

Low pressure gain measurements in KrF

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Abstract

Optical gain at 248 nm is measured in low pressure krypton/fluorine mixtures excited by an electron-beam. Measurable gain is observed down to a pressure of 50 mbar. Results are compared with the predictions of a simple kinetic model. The application of low pressure operation to ultra high power short pulse amplifiers is discussed.

Related Organizations

Science and Technology Facilities Council
United Kingdom
Rutherford Appleton Laboratory
United Kingdom

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