To develop greater LSIs, it is necessary to increase the number of pattern elements per unit area by reducing circuit patterns. The increase of pattern elements per chip needs high-speed pattern writing. The electron-beam lithography system has stepped into the limelight as one of the systems for meeting the demand of fine and high-speed writing. The electron-beam technology utilized in such a system is immature from the viewpoint of semiconductor production. In addition, it essentially requires modern technologies, such as electrooptics, precision machinary and Controlling electronics, a precision moving table, computers and software.