Chemical etching and polishing of InP

descriptionPublicationkeyboard_double_arrow_right Article , Part of book or chapter of book 01 Jan 1988 English Publisher:WileyJournal:Crystal Research and Technology, volume 23, pages 117-126 (issn: 0232-1300, eissn: 1521-4079,

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Authors: E. Kurth; A. Reif; V. Gottschalch; J Fenster; E Butter;

doi: 10.1002/crat.2170230117 , 10.1515/9783112485606-016

Chemical etching and polishing of InP

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Abstract

AbstractThis paper describes possibilities of several chemical preparations for the selective cleaning of InP surfaces. The investigations of the surface states after the chemical treatment were carried out by means of XPS measurements. A pre‐etching with (NH4)2S2O8:H2SO4:H2O and a polishing with 1% bromine in methanol produce optically smooth (100)‐ and (111) P surfaces free of oxides.

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