
Electrical Critical Dimension Test Structures (ECD-TS) have been applied for development of new technology: Metallic High Aspect Ratio Nano Structures (Metal-HARNS). The HARNS refer to electro mechanical structures scaled down to submicron width (as narrow as 260nm confirmed) while keeping its thickness (up to 1500nmconfirmed). Two major advantage and challenge have been confirmed through measurement: (1) insulating material showed critical advantage on ECD over Scanning Electron Microscope CD assessment and (2) seed conductive layer affected the measurement as leakage path.
MEMS, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Electrical Critical Dimension (ECD) High Aspect Ratio Nano Structures MEMS Electroplating, High Aspect Ratio Nano Structures, Electrical Critical Dimension (ECD), Electroplating
MEMS, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Electrical Critical Dimension (ECD) High Aspect Ratio Nano Structures MEMS Electroplating, High Aspect Ratio Nano Structures, Electrical Critical Dimension (ECD), Electroplating
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