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doi: 10.1002/advs.202206416 , 10.5281/zenodo.6834271 , 10.5281/zenodo.7752139 , 10.5281/zenodo.6834272
pmid: 36935363
pmc: PMC10161078
doi: 10.1002/advs.202206416 , 10.5281/zenodo.6834271 , 10.5281/zenodo.7752139 , 10.5281/zenodo.6834272
pmid: 36935363
pmc: PMC10161078
AbstractMechanochromic materials alter their color in response to mechanical force and are useful for both fundamental studies and practical applications. Several approaches are used to render polymers mechanochromic, but they generally suffer from limitations in sensing range, capacity to provide quantitative information, and their capability to enable broad and simple implementation. Here, is it reported that these problems can be overcome by combining photonic structures, which alter their reflection upon deformation, with covalent mechanophores, whose spectral properties change upon mechanically induced bond scission, in hierarchically structured mechanochromic pigments. This is achieved by synthesizing microspheres consisting of an elastic polymer with spiropyran‐based cross‐links and non‐close‐packed silica nanoparticles. A strain of less than 1% can be detected in a shift of the reflection band from the photonic structure, while the onset strain for the conversion of the spiropyran into fluorescent merocyanine ranges from 30% to 70%, creating a broad strain detection range. The two responses are tailorable and synergistic, permitting the activation strain for the mechanophore response to be tuned. The mechano‐sensing photonic pigments are demonstrated to be readily incorporated into different polymeric materials of interest and quantitatively probe spatially heterogeneous deformations over a large strain range.
colloids, pigments, Science, Q, photonics, mechanochemistry, Research Articles, polymers, sensing
colloids, pigments, Science, Q, photonics, mechanochemistry, Research Articles, polymers, sensing
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| impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network. | Top 10% |
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