This contribution describes an approach to the problem of resolution and resolvability in scattering methods (e.g. X-ray diffraction, electron microscopy) in the presence of series termination and blurring. One-, two- and three-dimensional cases are considered separately. Formulas relating the effects of nominal resolution and blurring to peak resolvability are derived and analysed. We show that both blurring and series termination widen point source peaks thus reducing their resolvability.