Electroplating at room temperature was used to create NiW alloy thin films. After that, the electroplated NiW thin films were annealed at 200 degrees Celsius. The texture of NiW deposited films is oriented in the FCC phase. Morphological, structural, and mechanical characterizations were performed on them. On the surface, NiW films were brilliant and uniformly covered. NiW film deposition was also nanoscale, with an average crystalline size of roughly 92 nm. After annealing, the microhardness of NiW was 138 VHN.