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A method is presented for automated probing of on-wafer devices for measurements at millimetre-wave frequencies. The proposed method automatically detects the contact between the measurement probe and on-wafer device, based on the evaluation of variation in the input reflection coefficient. It is shown that using this automated technique, about five times better measurement repeatability is achieved in millimetre-wave device characterisation.
On-wafer probing, on-wafer contacting, measurement techniques
On-wafer probing, on-wafer contacting, measurement techniques
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