
随着High NAEUV光刻节点向2nm及以下推进,光刻机精度受热、振动、气流扰动及测量噪声等多源动态误差的耦合制约,传统单一误差补偿方法已无法满足亚纳米级精度需求。本文建立一套光刻机整机多源动态误差的实时融合与协同补偿控制框架。首先分析热、振、流、测四类误差的物理特性及其耦合机制,建立四场耦合递归状态空间模型。针对多传感器异构数据(温度、加速度、压力、干涉仪),设计多速率卡尔曼滤波实现误差状态的实时融合估计。在此基础上提出分层协同控制架构:上层采用分散式模型预测控制(DMPC)协调加热器、主动减振器、气流调节阀等执行器,下层本地控制器快速响应高频扰动。采用POD-DEIM对高频振动模态进行降阶,确保算法实时性。仿真结果表明,该方法可将动态套刻误差从1.5nm降至0.5nm以下,相比独立控制提升60%以上,且对传感器噪声和模型失配具有良好的鲁棒性。本文为国产HighNAEUV光刻机的精度突破提供了系统级理论工具
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