
The evaporation of droplets in an arc plasma flow under the action of an electron beam injected into the arc plasma and the condition of direct heating of microdroplets by beam electrons are considered. Analytical modeling shows that droplets ≤1 μm in size can be completely evaporated over time scales typical for cathodic arc deposition systems. It is shown that small microdroplets evaporate more intensively. The lower limit working points in terms of plasma electron density, and the electron energy and density of the injected energetic electrons required for droplet evaporation are found.
droplets, plasma optics, droplet evaporation, fast electrons, film deposition, vacuum-arc discharge
droplets, plasma optics, droplet evaporation, fast electrons, film deposition, vacuum-arc discharge
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