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Advances in modeling and optimization for two-photon lithography

Authors: Sedova, Valeriia; Ogor, Florie; Rovera, Joël; Tsilipakos, Odysseas; Wiedenmann, Jonas; Heggarty, Kevin; Erdmann, Andreas;

Advances in modeling and optimization for two-photon lithography

Abstract

Advances in Modeling and Optimization for Two-Photon Lithography

Countries
France, Greece, France
Keywords

computational modeling, [PHYS.PHYS.PHYS-OPTICS] Physics [physics]/Physics [physics]/Optics [physics.optics], [CHIM.POLY] Chemical Sciences/Polymers, two-photon lithography computational modeling two-photon polymerization metasurfaces, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, diffusion, Physical and theoretical chemistry, modeling, fabrication, Φυσική και θεωρητική χημεία, Optics. Light, metasurfaces, [PHYS] Physics [physics], 3D modeling, two-photon polymerization, voxels, photoresist materials, Οπτική. Φώς, polymerization, lithography, mathematical optimization, two-photon lithography, data modeling

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
1
Average
Average
Average
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