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doi: 10.5281/zenodo.17144
handle: 10044/1/77092
Data for "The effect of pattern overlap on the accuracy of high resolution electron backscatter diffraction measurements" Vivian Tong1, Jun Jiang1, Angus J Wilkinson2, and T Ben Britton1 1. Department of Materials, Imperial College London, Prince Consort Road, London, SW7 2AZ, UK 2. Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH, UK For more information please contact: b.britton@imperial.ac.uk (Ben Britton) -- The zip contains three subfolders: Fig4 Interaction volume measurement Fig14 Error approaching gb Fig16 GrainBoundaryProbability -- Further details: Fig4 Interaction volume measurement - Measurement and simulation data of EBSD inteaction volume Includes calculated model & EBSD patterns for measurement EBSD patterns are from Zircaloy-4 and scanned on a Bruker eFlashHR camera in high resolution mode (1600 x 1200) attached to a Zeiss Auriga-40 SEM. The sample was tilted to 70 degrees and the SEM image shows the tilt corrected scanned region. Fig14 Error approaching gb - 15 patterns are included that were used to create many simulated grain boundary pairs. These were captured from the same sample as used in Fig4. The spreadsheet details results shown in Fig 4. Fig 16 GrainBoundary Pobability - This describes results from the simple Voronoi tessalation model (virtual grain structure) and sampling with a fixed step size, similar to a real EBSD scan. Probabilities were calcualted for different interaction volume sizes and critical distances.
grain boundary, high-resolution EBSD, electron microscopy, materials science, diffraction, pattern overlap, electron backscatter diffraction, cross-correlation, Materials science--Research, material science, 004
grain boundary, high-resolution EBSD, electron microscopy, materials science, diffraction, pattern overlap, electron backscatter diffraction, cross-correlation, Materials science--Research, material science, 004
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