
Abstract The CMPO method for growing CdTe films with different compositions. Isolated Cd and Te sources with a purity of 99.9% and 99.999%, respectively, were used. The films were deposited on glass and a molybdenum substrate and kept at a temperature of 500 0 C. The samples were grown at atmospheric pressure in a hydrogen or nitrogen flow. The thickness of the obtained films varied from 0.5 to 1.5 μm. The effects of heat treatment on the electrophysical properties of CdTe films obtained by the CMPO method were investigated and the physical properties were comprehensively investigated . To study the physical properties of CdTe films, the authors used a comprehensive research method. The conductivity type of the obtained films, electrical conductivity and its temperature dependence, the Hall Effect and measurement of the I–V characteristics of the heterostructure were determined. Optical metallography, X-ray diffraction and atomic force microscopy were also used.
Chemical molecular beam deposition, films, optical metallography method, X-ray diffraction, atomic force microscope
Chemical molecular beam deposition, films, optical metallography method, X-ray diffraction, atomic force microscope
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