Silicon (Si) is one of the most important materials used in many RF applications. On-wafer characterization of Si-based devices, components and circuits is widely adopted. Recent investigations have been devoted to the study of parasitic probe and neighborhood effects in commercial alumina-based calibration substrates. However, these parasitic effects have not been thoroughly investigated for commercial silicon-based calibration substrates. Therefore, this paper presents a detailed study of a commercial high-resistivity silicon (HRSi) calibration substrate. The neighborhood effect in conjunction with probe influences is investigated up to D-band frequencies.

This work was supported by the European Metrology Programme for Innovation and Research (EMPIR), under the 20IND03 - FutureCom project. EMPIR programme is co-financed by the Participating States and from the European Union's Horizon 2020 Research and Innovation Programme. Funder ID: 10.13039/100014132 , Grant no: 20IND03