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This release defines how to handle files that only contain mesh or particle records gracefully. New attributes have been defined to document software dependencies and utilized hardware. The ED-PIC extension updated values for particle pushers. It further improves wordings for consistency throughout the standard. Changes to "1.0.1" Base Standard minor changes: meshesPath & particlesPath: optional (only when needed) #171 optional attributes to document software dependencies & hardware #170 softwareDependencies machine backwards compatible changes: fix wording: meshName means mesh record #168 fix wording: root path is a "group" as well #169 Extension ED-PIC: minor changes: particlePush: additional values defined #172 Data Converter No data conversion needed.
(Acknowledgements) The design of this standard is based on the experiences we gained in the last years implementing efficient, parallel I/O in several PIC codes, but most recently in PIConGPU (picongpu.hzdr.de). Special thanks goes to Felix Schmitt (formerly ZIH / TU Dresden, now with Nvidia ARC GmbH) and René Widera (HZDR).
Simulations, Open Access, Open Data, Particle-Mesh, HPC, Schema, File Markup
Simulations, Open Access, Open Data, Particle-Mesh, HPC, Schema, File Markup
| selected citations These citations are derived from selected sources. This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | 14 | |
| popularity This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network. | Top 10% | |
| influence This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically). | Top 10% | |
| impulse This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network. | Top 10% |
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