Conductive two-layer resist system for electron-beam lithography

Yoshihiro Todokoro; Atsuhiro Kajiya; Hisashi Watanabe

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Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Article . 1988 . Peer-reviewed

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https://dx.doi.org/10.1116/1.5...

Article

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Conductive two-layer resist system for electron-beam lithography

descriptionPublicationkeyboard_double_arrow_right Article 01 Jan 1988 English Publisher:American Vacuum SocietyJournal:Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, volume 6, pages 357-360 (issn: 0734-211X, eissn: 2327-9877,

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Authors: Yoshihiro Todokoro; Atsuhiro Kajiya; Hisashi Watanabe;

doi: 10.1116/1.583998

Conductive two-layer resist system for electron-beam lithography

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Abstract

A conductive organic film, ammonium poly(p-styrene sulfonate) (AmPSS) and conductive two-layer resist systems using AmPSS are described. Conductive two-layer resist systems consist of silicon-containing negative resist (SNR) (Toyo Soda) as the top imaging layer and AmPSS as the conductive bottom layer. SNR/AmPSS two-layer resist systems eliminate the charging effects in electron beam lithography.

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