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A detection method for a T-topped profile in resist patterns by top-down-view CD-SEM

descriptionPublicationkeyboard_double_arrow_right Article 06 May 2004Publisher:Japan Soc. of Appl. PhysJournal:Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference
Authors: A. Yamaguchi; H. Fukuda; O. Komuro; S. Yoneda; T. Iizumi;

doi: 10.1109/imnc.2003.1268522

A detection method for a T-topped profile in resist patterns by top-down-view CD-SEM

Abstract

In this paper, we have evaluated the characteristics of T-topped patterns with LER, the width of the white band, and a correlation coefficient between the left and right borders of the white band. It can be concluded that the evaluation of these features enables us to recognize a T-topped profile of a resist-pattern edge from only one top-down image by CD-SEM.

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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