In this paper, we present a periodic hollowed-out pyramid microstructure with excellent superhydrophobicity. In our approach, T-topping pillars and capillary-induced self-assembly methods were combined with the photolithography process to fabricate a hollowed-out pyramid structure. First, a wideband ultraviolet source without a filter was used to fabricate the T-topping pillars during the exposure process; then, the evaporation-induced assembly collapsed the pillars and formed the hollowed-out pyramid structure. Scanning electron microscopy images showed the microstructures of the prepared surface. The contact angle of the surface was 154°. The surface showed excellent high temperature and ultraviolet irradiation tolerance, and the contact angle of the surface barely changed when the temperature dropped. This excellent environmental durability of our superhydrophobic surface has potential applications for self-cleaning and friction drag reduction under water.