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[New acrylic resins with very low residual monomer].

Authors: Y, Ohe; Y, Kadoma; Y, Imai;

[New acrylic resins with very low residual monomer].

Abstract

New experimental acrylic resins were prepared by polymerization of MMA in the presence of vinylidene fluoride/hexafluoropropylene copolymer. The amount of residual monomer in the resins prepared by visible light curing, cold curing, and heat curing, at various polymer/monomer ratios, was measured and compared with the usual MMA/PMMA resin. In the visible light cured resins containing 60 or 70 wt% of the fluoropolymer, the amount of residual monomer was less than 0.1%. In the cold cured resins, the amount of residual monomer was very low: 0.2% and 0.7% for the resins containing 70 and 60 wt% of the polymer, respectively. These values were comparable to the usual heat cured MMA/PMMA resins. In the heat cured resins, the amount of residual monomer was the lowest; less than 0.1%, even in the resin consisting of 50 wt% polymer. Thus, we prepared new acrylic resins with much less residual monomer than the usual MMA/PMMA resins.

Keywords

Fluorides, Vinyl Compounds, Acrylic Resins, Polypropylenes

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selected citations
These citations are derived from selected sources.
This is an alternative to the "Influence" indicator, which also reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Citations provided by BIP!
popularity
This indicator reflects the "current" impact/attention (the "hype") of an article in the research community at large, based on the underlying citation network.
BIP!Popularity provided by BIP!
influence
This indicator reflects the overall/total impact of an article in the research community at large, based on the underlying citation network (diachronically).
BIP!Influence provided by BIP!
impulse
This indicator reflects the initial momentum of an article directly after its publication, based on the underlying citation network.
BIP!Impulse provided by BIP!
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Average
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