
handle: 11311/1007608
A sparse combined generalized polynomial chaos model is proposed to characterize the impact of fabrication process variations in photonic circuits and perform design optimization. Simulations on a realistic example confirm the effectiveness of the technique.
Photonic Circuits; Polynomial Chaos Expansion; Stochastic Processes; Uncertainty Quantification; Electronic, Optical and Magnetic Materials; Atomic and Molecular Physics, and Optics; Signal Processing; Computer Networks and Communications; Electrical and Electronic Engineering
Photonic Circuits; Polynomial Chaos Expansion; Stochastic Processes; Uncertainty Quantification; Electronic, Optical and Magnetic Materials; Atomic and Molecular Physics, and Optics; Signal Processing; Computer Networks and Communications; Electrical and Electronic Engineering
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