Growth of Tin Oxide in Opal

descriptionPublicationkeyboard_double_arrow_right Article 01 Nov 2000 Spain Publisher:WileyJournal:Chemical Vapor Deposition, volume 6, pages 283-285 (issn: 0948-1907, eissn: 1521-3862,

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Authors: Yates, H. M.; Pemble, M. E.; Blanco Montes, Álvaro; Míguez, Hernán; López, Cefe; Meseguer, Francisco;

doi: 10.1002/1521-3862(200011)6:6<283::aid-cvde283>3.3.co;2-j , 10.1002/1521-3862(200011)6:6<283::aid-cvde283>3.0.co;2-s

handle: 10261/53383

Growth of Tin Oxide in Opal

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Abstract

Tin oxide was chemical vapor deposited by alternate introduction of the precursors. The polycrystalline deposit was found to coat the opal spheres to a thickness of about 18 nm.

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Country

Spain

Related Organizations

Spanish National Research Council
Spain
Universitat Politècnica de València
Spain
University of Salford
United Kingdom
Instituto de Ciencia de Materiales de Madrid
Spain

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